Profile of titanium lines produced by excimer laser direct writing on lithium niobate

Lavoie, C.; Meunier, M.; Boivin, S.; Izquierdo, R. et Desjardins, P. (1991). « Profile of titanium lines produced by excimer laser direct writing on lithium niobate ». Journal of Applied Physics, 70(4), pp. 2343-2347.

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Résumé

The profile of titanium (Ti) lines produced by KrF excimer laser direct writing on lithium niobate (LiNb03) has been investigated in detail since it is critical in the fabrication of Ti in-diffused LiNbOs optical waveguides. Lines written at speeds varying from 0.5 to 10 um/s have typical thicknesses and linewidths varying from 10 to 185 nm and from 2 to 24 pm, respectively. At a low power density E, the maximum thickness t is proportional to the number of photons or the power density. Increasing E allows a sufficient heating, which leads to the diffusion of Ti into LiNbOs, resulting in a sharp decrease of the thickness in the middle of the deposited line.

Type: Article de revue scientifique
Mots-clés ou Sujets: Titanium, lithium niobate, excimer lasers
Unité d'appartenance: Faculté des sciences > Département d'informatique
Déposé par: Ricardo Izquierdo
Date de dépôt: 11 févr. 2016 14:35
Dernière modification: 20 avr. 2016 19:28
Adresse URL : http://www.archipel.uqam.ca/id/eprint/7793

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